Instrumental Facilities

TW-class Ti:Sapphire-based ultrafast laser system
TW-class Ti:Sapphire-based ultrafast laser system
– Amplitude Technologies S.A. –
45TW, <25fs, single-shot up to 10Hz
<35fs, >10mJ pp synchronized probe beam
 CEP-stabilized, Ti:Sapphire-based ultrafast laser system
FLasers
Hardware1
Ultrafast Ti:Sapphire laser system
Femtolasers GmbH
Oscillator: <10fs, 200mW (avg), 80 MHz CEP-stabilized
Amplifier: <35fs, >1.5mJ pp, 1 KHz CEP-stabilized
External fiber compressor: <7fs, >0.8mJ pp, 1 KHz CEP-stabilized
High performance X-pinch system and picosecond laser shadawgraphy
X-Pinch
Picosecond Q-switched laser
SBS compressed Nd: YAG laser, 150ps, 250mJ pp (max) 10Hz
four harmonics (EKSPLA): <10fs, 200mW (avg)
80 MHz CEP-stabilized
Dynamic nanosecond interferometry
ns-laser
Dynamic nanosecond interferometry for plasma and matelial charachterization
Single longitudinal mode Nd: YAG laser, 6ns, 850mJ pp (max), 10Hz, four harmonics (Quantel)
Strong laser-matter interaction
OLYMPUS DIGITAL CAMERA
Miniature plasma focus
0-MPF Device
MPF: High performacne, plasma focus device
3d-holographic-camera
Electronic Speckle Pattern Interferometry (ESPI) system
Plasma & material characterization
CW, DPSS Lasers for Interferometry and Holography
5W, 532nm, single longitudinal mode (Coherent)
Ultra fast laser pulse characterization device
(down to 5 fs)
3D Holographic Camera
MeV Electron Magnetic Energy Analyzer